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Patent Searching and Data


Title:
マイクロアレイ・スキャニングにおける露出過度および光流出を防止するマスキング
Document Type and Number:
Japanese Patent JP2009519466
Kind Code:
A
Abstract:
Scanning of a microarray is performed through a mask that exposes a plurality, but not all, of the sites of the microarray, and either the mask is movable relative to the microarray or the microarray is movable relative to the mask, or both. The mask is useful as a means of restricting the illumination of sites on the microarray to those that can be illuminated while the scan head is traveling at a steady, target velocity, blocking the passage of light between the scan head and the microarray at those points in the scan head trajectory where the scan head is either accelerating or decelerating. The mask is also useful for reducing background noise in the microarray image by preventing light spillage to sites adjacent to those being scanned.

Inventors:
Chu, Daniel Wye.
Application Number:
JP2008545638A
Publication Date:
May 14, 2009
Filing Date:
December 04, 2006
Export Citation:
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Assignee:
Bio - Rad Laboratories, Lee emissions Incorporated Rei tee de
International Classes:
G01N33/53; G01N21/01; G01N37/00
Attorney, Agent or Firm:
Atsushi Aoki
Jun Tsuruta
Tetsuro Shimada
Kazuo Maejima
Hirose Shigeki
Yoshimitsu Mizumoto