Title:
複数の容量および誘導プラズマ源を備えたプラズマ処理リアクタ
Document Type and Number:
Japanese Patent JP2009527128
Kind Code:
A
Abstract:
Plasma processing chamber having a bottom electrode assembly is disclosed. The assembly has an inner bottom electrode for supporting a substrate and an outer bottom electrode disposed outside of the inner bottom electrode. The outer bottom electrode defines a region for chamber cleaning, and the outer bottom electrode includes a conductive ring and an inductive coil placed under the conductive ring. Further included is a dielectric material disposed between the inner bottom electrode and the outer bottom electrode, and the dielectric material separates the inner bottom electrode from the outer bottom electrode. A switch is provided for connecting radio frequency (RF) power to either the inner bottom electrode or the outer bottom electrode. The chamber also includes a top electrode assembly with a top electrode. The top electrode is disposed above both the inner and outer bottom electrodes.
Inventors:
Dindosa Razinder
Application Number:
JP2008555398A
Publication Date:
July 23, 2009
Filing Date:
February 15, 2007
Export Citation:
Assignee:
LAM RESEARCH CORPORATION
International Classes:
H01L21/3065
Domestic Patent References:
| JPH09260098A | 1997-10-03 | |||
| JPH10326772A | 1998-12-08 | |||
| JP2003155569A | 2003-05-30 | |||
| JP2004241792A | 2004-08-26 | |||
| JP2005526381A | 2005-09-02 |
Attorney, Agent or Firm:
Meisei International Patent Office