Title:
プラズマ処理装置内のRF駆動型電極へのガス配送用のRFチョーク
Document Type and Number:
Japanese Patent JP2010534390
Kind Code:
A
Abstract:
In large area plasma processing systems, process gases may be introduced to the chamber via the showerhead assembly which may be driven as an RF electrode. The gas feed tube, which is grounded, is electrically isolated from the showerhead. The gas feed tube may provide not only process gases, but also cleaning gases from a remote plasma source to the process chamber. The inside of the gas feed tube may remain at either a low RF field or a zero RF field to avoid premature gas breakdown within the gas feed tube that may lead to parasitic plasma formation between the gas source and the showerhead. By feeding the gas through an RF choke, the RF field and the processing gas may be introduced to the processing chamber through a common location and thus simplify the chamber design.
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Inventors:
Kudela, Joseph
Sorensen, Karl A.
White, John M.
Sorensen, Karl A.
White, John M.
Application Number:
JP2010517055A
Publication Date:
November 04, 2010
Filing Date:
June 25, 2008
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H05H1/46; C23C16/509; H01L21/205; H01L21/3065
Domestic Patent References:
| JPH04249007A | 1992-09-04 | |||
| JP2007077502A | 2007-03-29 | |||
| JP2002288864A | 2002-10-04 | |||
| JP2002314124A | 2002-10-25 | |||
| JP2005255489A | 2005-09-22 | |||
| JPH04249007A | 1992-09-04 |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yuichi Yamada
Ikeda adult
Yuichi Yamada
Ikeda adult