Title:
フォトリソグラフィープロセス用の非共有結合架橋性材料
Document Type and Number:
Japanese Patent JP2010535360
Kind Code:
A
Abstract:
This invention describes compositions and methods of using non-covalently crosslinked resin coatings for lithographic applications. These materials are designed to undergo, after coating, a change that provides solvent resistance and, with some materials, simultaneous aqueous-base solubility. Non-covalent interactions allow for easier removal of these coatings than of covalently crosslinked materials. These types of materials are well-suited for trench and gap fill applications, as well as for anti-reflective coatings, spin-on carbon layers, and etch masks.
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Inventors:
Sullivan Daniel M.
Fan Lung Hoi
Neil Charles Jay.
Dai Jinhwa
Swoop Michael Bee.
Fan Lung Hoi
Neil Charles Jay.
Dai Jinhwa
Swoop Michael Bee.
Application Number:
JP2010520114A
Publication Date:
November 18, 2010
Filing Date:
July 28, 2008
Export Citation:
Assignee:
Brewer Science INC.
International Classes:
G03F7/11; B32B27/00; C08F212/14; C08F226/06; G03F7/09
Domestic Patent References:
| JPH08509756A | 1996-10-15 | |||
| JPH04122942A | 1992-04-23 | |||
| JP2003066607A | 2003-03-05 | |||
| JP2006030477A | 2006-02-02 | |||
| JP2004211015A | 2004-07-29 | |||
| JP2002225452A | 2002-08-14 | |||
| JP2000356851A | 2000-12-26 | |||
| JPH09106073A | 1997-04-22 | |||
| JP2009543149A | 2009-12-03 | |||
| JPH07128859A | 1995-05-19 | |||
| JPS6068056A | 1985-04-18 | |||
| JPH08509756A | 1996-10-15 | |||
| JPH04122942A | 1992-04-23 |
Foreign References:
| WO2005013601A1 | 2005-02-10 | |||
| WO2005013601A1 | 2005-02-10 |
Attorney, Agent or Firm:
Nozomi Watanabe
Haruko Sanwa
Haruko Sanwa