Title:
選択的エッチング方法および装置
Document Type and Number:
Japanese Patent JP2011503906
Kind Code:
A
Abstract:
Method and device for selectively etching a first material (4) relative to a second material (2), comprising a bath (11) of a solution capable of producing at least one chemical species for etching the first material (4) but not the second (2) and a system (12) for generating ultrasound at a frequency between 100 kHz and 3 MHz in the bath in order to produce cavitation bubbles.
Inventors:
Bayer Francis
Gondorxon Nicola
Gondorxon Nicola
Application Number:
JP2010534523A
Publication Date:
January 27, 2011
Filing Date:
November 17, 2008
Export Citation:
Assignee:
Ansitu Polytechnic de Grenoble
Universite Joseph Frie
Universite Joseph Frie
International Classes:
H01L21/306
Domestic Patent References:
| JPH10154690A | 1998-06-09 | |||
| JPS6066825A | 1985-04-17 | |||
| JPS52114275A | 1977-09-24 | |||
| JPH10154690A | 1998-06-09 | |||
| JPS59231818A | 1984-12-26 |
Foreign References:
| US20040061199A1 | 2004-04-01 |
Attorney, Agent or Firm:
Nozomi Watanabe
Haruko Sanwa
Haruko Sanwa