Title:
アンダーポテンシャル析出で媒介される薄膜の逐次積層成長
Document Type and Number:
Japanese Patent JP2011526655
Kind Code:
A
Abstract:
A method of depositing contiguous, conformal submonolayer-to-multilayer thin films with atomic-level control is described. The process involves electrochemically exchanging a mediating element on a substrate with a noble metal film by alternatingly sweeping potential in forward and reverse directions for a predetermined number of times in an electrochemical cell. By cycling the applied voltage between the bulk deposition potential for the mediating element and the material to be deposited, repeated desorption/adsorption of the mediating element during each potential cycle can be used to precisely control film growth on a layer-by-layer basis.
Inventors:
One, Jia Xu
Adzic, Radslab Earl.
Adzic, Radslab Earl.
Application Number:
JP2011516512A
Publication Date:
October 13, 2011
Filing Date:
June 23, 2009
Export Citation:
Assignee:
Brookhaven Science Associates
International Classes:
C25D21/12; B82Y30/00; B82Y40/00; C25D5/18; H01M4/86; H01M4/88
Domestic Patent References:
| JP2000080495A | 2000-03-21 | |||
| JP2004204351A | 2004-07-22 | |||
| JP2000080495A | 2000-03-21 |
Foreign References:
| US4378406A | 1983-03-29 | |||
| US20060234039A1 | 2006-10-19 | |||
| WO2007073162A2 | 2007-06-28 | |||
| US4378406A | 1983-03-29 | |||
| US20060234039A1 | 2006-10-19 |
Attorney, Agent or Firm:
Yukihisa Goto