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Title:
自己浄化アノードを含む閉ドリフト磁場イオン源装置および同装置による基板改質プロセス
Document Type and Number:
Japanese Patent JP2012511242
Kind Code:
A
Inventors:
John Maddox
Application Number:
JP2011539794A
Publication Date:
May 17, 2012
Filing Date:
December 08, 2009
Export Citation:
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Assignee:
General Plasma Incorporated
International Classes:
H05H1/24; C23C14/35; H01J27/14; H01J37/08; H01L21/205; H01L21/3065; H01L21/31; H05H1/46
Domestic Patent References:
JP2004537825A2004-12-16
JPH08212953A1996-08-20
JP2001511580A2001-08-14
Foreign References:
WO2007124032A22007-11-01
WO2008118203A22008-10-02
US20040075060A12004-04-22
US5646476A1997-07-08
Attorney, Agent or Firm:
Yasuhiko Murayama
Masatake Shiga
Takashi Watanabe
Shinya Mitsuhiro



 
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