Title:
ルテニウムの低温堆積のための組成物及び方法
Document Type and Number:
Japanese Patent JP2012515842
Kind Code:
A
Abstract:
Composition and method for depositing ruthenium. A composition containing ruthenium tetroxide RuO4 is used as a precursor solution 608 to coat substrates 400 via ALD, plasma enhanced deposition, and/or CVD. Periodic plasma densification may be used.
Inventors:
Agit Palangepe
Vinayak Viru Watts
Randiel Bubbell
Vinayak Viru Watts
Randiel Bubbell
Application Number:
JP2011546424A
Publication Date:
July 12, 2012
Filing Date:
January 19, 2010
Export Citation:
Assignee:
Beeco Instruments Incorporated
International Classes:
H01L21/28; C23C16/448; H01L21/285
Foreign References:
| WO2008102320A2 | 2008-08-28 |
Attorney, Agent or Firm:
Yasuhiko Murayama
Masatake Shiga
Takashi Watanabe
Shinya Mitsuhiro
Masatake Shiga
Takashi Watanabe
Shinya Mitsuhiro