Title:
真空室内で回転するマグネトロンを用いた基板の成膜方法
Document Type and Number:
Japanese Patent JP2012530851
Kind Code:
A
Abstract:
In a method for coating a substrate in a vacuum chamber having a rotating magnetron, wherein a substrate is guided past the magnetron in a substrate transport direction and is coated by a material, which has been isolated from a target connected to the magnetron, and, optionally with the material reacting with a reactive gas present in the vacuum chamber, homogeneity of the coating layer on a substrate is improved by stabilizing the working point by way of the target rotation. This is achieved in that a periodic change of a first process parameter caused by the target revolution is compensated for by a periodic change of a second process parameter having a determined level and/or by employing two magnetrons having different rotational speeds.
Inventors:
Rinse Volker
Vensche tiro
Vensche tiro
Application Number:
JP2012516775A
Publication Date:
December 06, 2012
Filing Date:
June 28, 2010
Export Citation:
Assignee:
Huon Ardenne Anragen Tehinik Gezershyaft Mito Besilyenktel Haftung
International Classes:
C23C14/34; C23C14/35
Domestic Patent References:
| JP2006316340A | 2006-11-24 | |||
| JPH10509773A | 1998-09-22 | |||
| JP2002529600A | 2002-09-10 |
Foreign References:
| US20100200395A1 | 2010-08-12 |
Attorney, Agent or Firm:
Mitsufumi Esaki
Blacksmith
Ryota Imamura
Kiyota Eisho
Blacksmith
Ryota Imamura
Kiyota Eisho