Title:
マイクロリソグラフィ投影露光装置の照明系
Document Type and Number:
Japanese Patent JP2013527988
Kind Code:
A
Abstract:
An illumination system of a microlithographic projection exposure apparatus includes a spatial light modulator which varies an intensity distribution in a pupil surface. The modulator includes an array of mirrors that reflect impinging projection light into directions that depend on control signals applied to the mirrors. A prism, which directs the projection light towards the spatial light modulator, has a double pass surface on which the projection light impinges twice, namely a first time when leaving the prism and before it is reflected by the mirrors, and a second time when entering the prism and after it has been reflected by the mirrors. A pupil perturbation suppressing mechanism is provided that reduces reflections of projection light when it impinges the first time on the double pass surface, and/or prevents that light portions being a result of such reflections contribute to the intensity distribution in the pupil surface.
Inventors:
Degunter Marx
Fiorca damian
Ziegler Gehart-Wilhelm
Fiorca damian
Ziegler Gehart-Wilhelm
Application Number:
JP2013508375A
Publication Date:
July 04, 2013
Filing Date:
May 06, 2010
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
H01L21/027; G02B19/00; G03F7/20
Domestic Patent References:
| JP2005352080A | 2005-12-22 | |||
| JP2003322711A | 2003-11-14 | |||
| JP2004191878A | 2004-07-08 | |||
| JP2010096840A | 2010-04-30 | |||
| JP2003322822A | 2003-11-14 |
Foreign References:
| WO2009060773A1 | 2009-05-14 | |||
| WO2008095695A2 | 2008-08-14 | |||
| WO2002019027A1 | 2002-03-07 | |||
| WO2009125511A1 | 2009-10-15 |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Hiroshi Oura
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Hiroshi Oura