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Title:
マイクロリソグラフィ用の照明光学系及びこの種の照明光学系を有する投影露光系
Document Type and Number:
Japanese Patent JP2013530534
Kind Code:
A
Abstract:
A microlithography illumination optical system is used to guide illumination light from a primary light source to an object field. A mirror array of the illumination optical system has a plurality of individual mirrors, which can be tilted independently of one another by actuators and are connected to associated tilting actuators. A controller is used to activate the actuators. A raster module of the illumination optical system has a plurality of raster elements to produce a spatially distributed arrangement of secondary light sources.

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Inventors:
Patra Michael
Degunter Marx
Rai Michael
Application Number:
JP2013514638A
Publication Date:
July 25, 2013
Filing Date:
June 08, 2011
Export Citation:
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Assignee:
Carl Zeiss SGM Gaehha
International Classes:
H01L21/027; G02B3/00; G02B19/00
Domestic Patent References:
JP2008227497A2008-09-25
JP2006253529A2006-09-21
JPH10270312A1998-10-09
JP2004245912A2004-09-02
JPH10233362A1998-09-02
JP2009105396A2009-05-14
JP2008258605A2008-10-23
JP2008227497A2008-09-25
JP2006253529A2006-09-21
JPH10270312A1998-10-09
JP2004245912A2004-09-02
JPH10233362A1998-09-02
Foreign References:
WO2009080231A12009-07-02
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi



 
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