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Title:
EUV投影露光系のためのミラー、光学系、及び構成要素を生成する方法
Document Type and Number:
Japanese Patent JP2013540350
Kind Code:
A
Abstract:
A mirror for EUV radiation includes a mirror body, which has at least one EUV radiation-reflecting region and at least two EUV radiation-permeable regions. A spatial separation of the illumination and imaging beam paths is possible with small angles of incidence and a large object-side numerical aperture.

Inventors:
Ruof Johannes
Feltman Heiko
Application Number:
JP2013530691A
Publication Date:
October 31, 2013
Filing Date:
September 26, 2011
Export Citation:
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Assignee:
Carl Zeiss SGM Gaehha
International Classes:
H01L21/027; G02B19/00
Domestic Patent References:
JP2004006716A2004-01-08
JP2008135743A2008-06-12
JP2001116900A2001-04-27
JP2003008124A2003-01-10
JP2009532891A2009-09-10
JP2007264636A2007-10-11
JP2006186365A2006-07-13
JP2012502490A2012-01-26
JPH11238666A1999-08-31
JP2013513957A2013-04-22
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Nobuyuki Taniguchi