Title:
EUV投影露光系のためのミラー、光学系、及び構成要素を生成する方法
Document Type and Number:
Japanese Patent JP2013540350
Kind Code:
A
Abstract:
A mirror for EUV radiation includes a mirror body, which has at least one EUV radiation-reflecting region and at least two EUV radiation-permeable regions. A spatial separation of the illumination and imaging beam paths is possible with small angles of incidence and a large object-side numerical aperture.
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Inventors:
Ruof Johannes
Feltman Heiko
Feltman Heiko
Application Number:
JP2013530691A
Publication Date:
October 31, 2013
Filing Date:
September 26, 2011
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
H01L21/027; G02B19/00
Domestic Patent References:
JP2004006716A | 2004-01-08 | |||
JP2008135743A | 2008-06-12 | |||
JP2001116900A | 2001-04-27 | |||
JP2003008124A | 2003-01-10 | |||
JP2009532891A | 2009-09-10 | |||
JP2007264636A | 2007-10-11 | |||
JP2006186365A | 2006-07-13 | |||
JP2012502490A | 2012-01-26 | |||
JPH11238666A | 1999-08-31 | |||
JP2013513957A | 2013-04-22 |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Nobuyuki Taniguchi
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Nobuyuki Taniguchi