Title:
多段インプリントによるハイコントラストな整列マーク
Document Type and Number:
Japanese Patent JP2013543456
Kind Code:
A
Abstract:
Two-stage imprinting techniques capable of protecting fine patterned features of an imprint lithography template are herein described. In particular, such techniques may be used during fabrication of recessed high-contrast alignment marks for preventing deposited metal layers from coming into contact with fine features etched into the template.
Inventors:
Imhoff, Joseph Michael
Serindis, Costa
Love Lake, Dwayne El
Serindis, Costa
Love Lake, Dwayne El
Application Number:
JP2013530391A
Publication Date:
December 05, 2013
Filing Date:
September 26, 2011
Export Citation:
Assignee:
Molecular Imprints Incorporated
International Classes:
B29C43/02; B29C43/34
Domestic Patent References:
| JP2008137387A | 2008-06-19 | |||
| JP2005026660A | 2005-01-27 | |||
| JP2007103915A | 2007-04-19 | |||
| JP2004522313A | 2004-07-22 |
Attorney, Agent or Firm:
Masaki Yamakawa
Shigeki Yamakawa
Shigeki Yamakawa