Title:
ALDコーティングシステム
Document Type and Number:
Japanese Patent JP2013544965
Kind Code:
A
Abstract:
An ALD coating method to provide a coating surface on a substrate is provided. The ALD coating method comprises: providing a deposition heading including a unit cell having a first precursor nozzle assembly and a second precursor nozzle assembly; emitting a first precursor from the first precursor nozzle assembly into chamber under atmospheric conditions in a direction substantially normal to the coating surface; emitting a second precursor from the first precursor nozzle assembly into chamber under atmospheric conditions in a direction substantially normal to the coating surface; removing moving the substrate under the deposition head such that the first precursor is directed onto a first area of the coating surface prior to the second precursor being directed onto the first area of the coating surface.
Inventors:
Michael Jay Surchen
Ganesh M Sandalam
Roger Earl Koutu
Jill Svenya Becker
Mark Jay Dulvers
Ganesh M Sandalam
Roger Earl Koutu
Jill Svenya Becker
Mark Jay Dulvers
Application Number:
JP2013534022A
Publication Date:
December 19, 2013
Filing Date:
October 14, 2011
Export Citation:
Assignee:
CAMBRIDGE NANOTECH INC.
International Classes:
C23C16/455; H01L21/31
Domestic Patent References:
| JP2009540122A | 2009-11-19 | |||
| JP2010515821A | 2010-05-13 | |||
| JP2000309869A | 2000-11-07 | |||
| JP2004235660A | 2004-08-19 | |||
| JP2005116900A | 2005-04-28 | |||
| JP2004072085A | 2004-03-04 | |||
| JPH11335868A | 1999-12-07 | |||
| JP2009540122A | 2009-11-19 |
Attorney, Agent or Firm:
Samejima Mutsumi
Kyousei Tamura
Keiichi
Yoshida Tamaki
Kyousei Tamura
Keiichi
Yoshida Tamaki