LIGHT FLUX CONVERSION ELEMENT, ILLUMINATION OPTICAL DEVICE, EXPOSURE DEVICE, AND EXPOSURE METHOD

Japanese Patent JP2014195094

A

PROBLEM TO BE SOLVED: To provide an illumination optical device which can form an annular pupil distribution in circumferential polarization state, while suppressing light quantity loss well.SOLUTION: The illumination optical device includes a light flux conversion element 50 for forming an annular light intensity distribution on a predetermined surface on the basis of an incident light flux. The light flux conversion element consists of a first basic element 50A formed of an optical material having optical rotation, and forming a first arcuate region distribution out of annular light intensity distributions on the basis of the incident light flux, a second basic element 50B for forming a second arcuate region distribution, a third basic element 50C for forming a third arcuate region distribution, and a fourth basic element 50D for forming a fourth arcuate region distribution. Each basic element has a different thickness in the transmission direction of light.

JP5264575	Positive resist composition and resist pattern forming method
JPS5452987	ELECTRON BEAM EXPOSURE DEVICE

TOYODA MITSUNORI

JP2014096136A

October 09, 2014

May 07, 2014

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NIKON CORP

H01L21/027; G02B5/18; G02B5/30; G02B19/00; G02B27/00; G02B27/28; G02B27/44; G03F7/20

JPH09184918A	1997-07-15
JPH0757992A	1995-03-03
JPH06120110A	1994-04-28
JPS6344726A	1988-02-25
JP2006269462A	2006-10-05
JP2010226117A	2010-10-07
JPS6344726A	1988-02-25
JPH06120110A	1994-04-28
JPH0757992A	1995-03-03
JPH09184918A	1997-07-15
JP2006269462A	2006-10-05

WO2001035451A1	2001-05-17
WO2001035451A1	2001-05-17

Seiji Ono
Eiryou Kobayashi
Shinji Kato
Mamoru Suzuki
Hiroshi Otani

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