収束電磁放射により物質を処理する装置および方法

Japanese Patent JP2014501618

A

The invention relates to a device for processing material (M) by means of focused electromagnetic radiation comprising: a source (10), which emits electromagnetic radiation (12), means (14, 16, 18, 22, 26) for directing the radiation at the material (M), means (28) for focusing the radiation on or in the material (M), an apparatus (20) for producing a pattern (32) in the beam path of the electromagnetic radiation, an at least partially reflective surface (30) in the beam path in front of the focus (F) of the focused radiation, wherein said pattern (32) is imaged on said at least partially reflective surface (30) by means of at least some of said means for directing the radiation and said means for focusing the radiation, at least one detector (D1, D2), onto which an image of the pattern (32) of said surface (30) is reflected and which produces electrical signals corresponding to said image, wherein the image contains a piece of information about the position of the focal point (F), a computer (C), which receives said electrical signals and which is programmed to process said image in order to generate an electrical signal (34) that depends on the position of the focal point, and a divergence setting element (18), which is arranged in said beam path and designed to receive said electrical signal (34) of the computer (10) in order to change a divergence of the electromagnetic radiation according to the signal.

Warm Bernd
Riedel Peter
Gorschvos Claudia
Voyteneck Franziska

JP2013530578A

January 23, 2014

September 30, 2010

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Wavelight Game Bha

B23K26/046; A61B18/20; A61F9/008; B23K26/073

JP2009527265A	2009-07-30
JP2003251476A	2003-09-09
JP2001070337A	2001-03-21

Susumu Ito
Yasushi Hasegawa
Osamu Shinoura

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