Title:
ガス-粒子プロセス
Document Type and Number:
Japanese Patent JP2014503343
Kind Code:
A
Abstract:
A gas-particle processing method comprising: introducing gas into a chamber through a gas inlet; flowing the gas through the chamber from the gas inlet to the gas outlet at a first controlled mass flowrate; introducing at least one particle stream into the chamber through one or more particle inlets of the chamber at a second controlled mass flowrate; flowing each particle stream through a respective processing region in the chamber; and controlling the first and/or second mass flowrates, such that the gas-particle mixture porosity in a substantial portion of each processing region is 0.900-0.995.
Inventors:
Owen Potter
Application Number:
JP2013540178A
Publication Date:
February 13, 2014
Filing Date:
November 25, 2011
Export Citation:
Assignee:
Owen Potter
International Classes:
B01J8/12; B01J10/00
Domestic Patent References:
| JPS3631395Y1 | ||||
| JPS5168067A | 1976-06-12 |
Foreign References:
| GB826020A | 1959-12-23 | |||
| US2376365A | 1945-05-22 |
Attorney, Agent or Firm:
Shinjiro Ono
Yasushi Kobayashi
Shigeo Takeuchi
Osamu Yamamoto
Toru Miyamae
Yasushi Kobayashi
Shigeo Takeuchi
Osamu Yamamoto
Toru Miyamae