Title:
EUVリソグラフィ用の反射光学素子及び光学系
Document Type and Number:
Japanese Patent JP2014519196
Kind Code:
A
Abstract:
In order to reduce the negative influence of reactive hydrogen on the lifetime of a reflective optical element, particularly inside an EUV lithography device, there is proposed for the extreme ultraviolet and soft X-ray wavelength region a reflective optical element (50) having a reflective surface (60) with a multilayer system (51) and in the case of which the reflective surface (60) has a protective layer system (59) with an uppermost layer (56) composed of silicon carbide or ruthenium, the protective layer system (59) having a thickness of between 5 nm and 25 nm.
Inventors:
Dirk Heinrich Ame
Peter Hoover
Stephan mullender
Gizela von Blankenhagen
Peter Hoover
Stephan mullender
Gizela von Blankenhagen
Application Number:
JP2014510773A
Publication Date:
August 07, 2014
Filing Date:
May 15, 2012
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
H01L21/027; G02B19/00; G03F7/20
Domestic Patent References:
| JP2001059901A | 2001-03-06 | |||
| JP2010532554A | 2010-10-07 | |||
| JP2001110709A | 2001-04-20 | |||
| JP2009294659A | 2009-12-17 | |||
| JP2009253032A | 2009-10-29 | |||
| JP2011510480A | 2011-03-31 | |||
| JP2008288299A | 2008-11-27 | |||
| JP2006170916A | 2006-06-29 | |||
| JP2007140105A | 2007-06-07 |
Foreign References:
| WO2011039061A1 | 2011-04-07 |
Attorney, Agent or Firm:
Kenji Sugimura
Groundwork Kenichi
Tsubouchi Shin
Groundwork Kenichi
Tsubouchi Shin