Title:
ガス水和物連続製造装置
Document Type and Number:
Japanese Patent JP2014523397
Kind Code:
A
Abstract:
Embodiments of the inventive concept provide a successive gas hydrate manufacturing device, without hydration after generating gas hydrate slurry, capable of operating with a higher conversion rate and relatively low hydrate generation pressure and reducing a product cost by decreasing the number of processing steps for removing heat of reaction, for which the total exothermic value downs due to no need of latent heat according to a phase change rather than the case of generating a gas hydrate directly from a water solution, as well as making gas diffusion easier during reaction of generation and maximizing a contact area between water and gas to increase a gas capture rate and shorten the total hydrate generation time.
Inventors:
Kim, チョル * ホ
Kim, ホ * キョン
Li, ジェ * イク
John, テ * ソク
ホ, ジュ * ホ
Singh, ジェ * Ung
Kim, ホ * キョン
Li, ジェ * イク
John, テ * ソク
ホ, ジュ * ホ
Singh, ジェ * Ung
Application Number:
JP2013558783A
Publication Date:
September 11, 2014
Filing Date:
March 13, 2012
Export Citation:
Assignee:
S tea X Offshore And Ship building A company, the Limited
International Classes:
C07B63/02; B01J19/00; C07C9/04; C07C9/06; C07C9/08; C10L3/06; C07B61/00; C07C7/152
Domestic Patent References:
JPH10216505A | 1998-08-18 | |||
JP2009273978A | 2009-11-26 | |||
JP2009112995A | 2009-05-28 | |||
JP2004050167A | 2004-02-19 | |||
JP2007330891A | 2007-12-27 | |||
JP2010284605A | 2010-12-24 | |||
JP2009119463A | 2009-06-04 | |||
JP2006282694A | 2006-10-19 | |||
JP2006274140A | 2006-10-12 | |||
JP2010195988A | 2010-09-09 |
Foreign References:
KR20100081501A | 2010-07-15 | |||
US4199834A | 1980-04-29 | |||
US20090175774A1 | 2009-07-09 | |||
US20100099807A1 | 2010-04-22 |
Attorney, Agent or Firm:
Toshio Yoshikawa
Ichikawa 寛奈
Ichikawa 寛奈