Title:
SILOXANE-BASED ANTISTATIC AGENT COMPOSITION AND METHOD FOR PRODUCING THE SAME
Document Type and Number:
Japanese Patent JP2015030743
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a siloxane-based antistatic agent that has an improved water resistance, does not reduce antistatic performance even in a low humidity environment, and has a stable antistatic performance over time, and to provide an article including the siloxane-based antistatic agent.SOLUTION: A liquid antistatic agent composition comprises: a hydrolysis polycondensate of alkoxysilane that is obtained by hydrolyzing a mixture of a tetraalkoxysilane and/or an oligomer thereof and phenyl alkoxysilane and/or an oligomer thereof and performing polycondensation reaction, and has siloxane bonds (Si-O-Si) as a skelton; polystyrene sulfonic acid; and a solvent where the hydrolysis polycondensate of alkoxysilane and the polystyrene sulfonic acid are dissolved. Phenyl groups of the hydrolysis polycondensate of alkoxysilane and phenyl groups of the polystyrene sulfonic acid constitute a layered structure by π-π interaction.
Inventors:
YAMANAKA AKIHIKO
MAKABE KOJI
MAKABE KOJI
Application Number:
JP2013158938A
Publication Date:
February 16, 2015
Filing Date:
July 31, 2013
Export Citation:
Assignee:
COLCOAT KK
International Classes:
C09K3/16; C08G77/18; C09D5/24; C09D125/04; C09D183/02; C09D183/04
Domestic Patent References:
| JPH0978000A | 1997-03-25 |
Foreign References:
| WO2004003081A1 | 2004-01-08 |
Attorney, Agent or Firm:
Aoki 篤
Ishida 敬
Tetsuji Koga
Atsushi Ebiya
Ebita 尚則
Satoru Ideno
Ishida 敬
Tetsuji Koga
Atsushi Ebiya
Ebita 尚則
Satoru Ideno