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Title:
EXPOSURE METHOD AND DEVICE, ILLUMINATION OPTICAL DEVICE, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2015092604
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an exposure device and method that enables patterns of various pitches to be simultaneously transferred at high resolution respectively.SOLUTION: An exposure device comprises: an illumination optical system 12 for illuminating a reticle R with illumination light IL; and a projecting optical system PL for projecting an image of a pattern of the reticle R onto a wafer W. The exposure device comprises: a forming optical system that makes an illuminating condition for the reticle R variable, and that can create light quantity distribution by refraction optical elements 21 and 22, which generate luminous fluxes distributed in a plurality of areas where centers are arranged outside an optical axis on a predetermined face in an illumination optical system 12 conjugate with a pupil face of the projection optical system PL respectively, such that quantities of light in the plurality of areas are larger than those in other areas; and a polarization setting member for setting polarized states of the luminous fluxes generated from the refraction optical elements 21 and 22.

Inventors:
KUDO TAKETO
HIRUKAWA SHIGERU
Application Number:
JP2014256977A
Publication Date:
May 14, 2015
Filing Date:
December 19, 2014
Export Citation:
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Assignee:
NIKON CORP
International Classes:
H01L21/027; G02B19/00; G03F7/20
Domestic Patent References:
JPH0653120A1994-02-25
JP2002231619A2002-08-16
JPH07220995A1995-08-18
JP2000311853A2000-11-07
JP2002261004A2002-09-13
JPH10208993A1998-08-07
JPH05160002A1993-06-25
JPH06267825A1994-09-22
JPH05217840A1993-08-27
JPH07147223A1995-06-06
JPH06163350A1994-06-10
JPH08335552A1996-12-17
Foreign References:
WO2000011706A12000-03-02
Attorney, Agent or Firm:
Seiji Ohno
Kobayashi Hideyoshi
Shinji Kato
Mamoru Suzuki
Hiroshi Otani