Title:
ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, METHOD FOR MANUFACTURING DEVICE, AND POLARIZATION UNIT
Document Type and Number:
Japanese Patent JP2015132848
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an illumination optical system having high flexibility relating to a profile of pupil intensity distribution and changes in a polarization state without accompanying exchange of an optical member.SOLUTION: The illumination optical system illuminates an illumination objective surface with light from a light source, and the system includes: a spatial light modulator that has a plurality of optical elements arranged in a predetermined plane and individually controlled and that variably forms a light intensity distribution on an illumination pupil of the illumination optical system; and a polarization unit that is disposed at an optically conjugate position to the predetermined plane in an optical path on the illumination objective surface side of the spatial light modulator and that changes a polarization state of a part of a beam in an incident beam to exit.
Inventors:
TANITSU OSAMU
TANAKA HIROHISA
KATO KINYA
MORI KOJI
TANAKA HIROHISA
KATO KINYA
MORI KOJI
Application Number:
JP2015076962A
Publication Date:
July 23, 2015
Filing Date:
April 03, 2015
Export Citation:
Assignee:
NIKON CORP
International Classes:
G02B19/00; G03F7/20
Domestic Patent References:
| JP2009111223A | 2009-05-21 | |||
| JP2010087389A | 2010-04-15 | |||
| JP2006208432A | 2006-08-10 | |||
| JP2009111223A | 2009-05-21 | |||
| JP2010087389A | 2010-04-15 | |||
| JP2006208432A | 2006-08-10 |
Attorney, Agent or Firm:
Takao Yamaguchi