Title:
ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE
Document Type and Number:
Japanese Patent JP2016035593
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an illumination optical apparatus and an exposure apparatus which can contribute to increase in manufacture efficiency of a device with increase in an output of a light source, even when a spatial light modulation member is disposed in an optical path of light emitted from the light source, and a method for manufacturing a device.SOLUTION: An exposure apparatus 11 includes an illumination optical apparatus 13 that guides exposure light EL emitted from an exposure light source 12 to a reticle R. The illumination optical apparatus 13 includes a plurality of movable multimirrors 22 arranged in an array, in which each movable multimirror 22 is composed of a plurality of element mirrors having a movable reflection surface, arranged in an array. Each movable multimirror 22 is disposed in an optical path of the exposure light EL emitted from the light source 12.SELECTED DRAWING: Figure 1
Inventors:
HIROTA HIROYUKI
Application Number:
JP2015223763A
Publication Date:
March 17, 2016
Filing Date:
November 16, 2015
Export Citation:
Assignee:
NIKON CORP
International Classes:
G03F7/20; G02B3/00; G02B5/18; G02B7/20; G02B19/00; G02B26/08
Domestic Patent References:
| JP2007150295A | 2007-06-14 | |||
| JP2006284740A | 2006-10-19 | |||
| JP2005243870A | 2005-09-08 | |||
| JP2002353105A | 2002-12-06 | |||
| JP2007227918A | 2007-09-06 | |||
| JP2008259522A | 2008-10-30 |
Foreign References:
| WO2006085626A1 | 2006-08-17 |
Attorney, Agent or Firm:
Seiji Ohno
Kobayashi Hideyoshi
Hiroshi Otani
Kobayashi Hideyoshi
Hiroshi Otani
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