Title:
LIGHT RADIATION DEVICE FOR PERIPHERY EXPOSURE DEVICE
Document Type and Number:
Japanese Patent JP2016072543
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a light radiation device for periphery exposure device capable of radiating a light having radiation intensity distribution that sharply rises between a circuit pattern formation region and an edge of a wafer while suppressing occurrence of pattern collapse.SOLUTION: In the light radiation device for periphery exposure device which includes a light source emitting a light and exposes an edge of an object to be irradiated by irradiating a periphery of the edge with the light, the light source forms the predetermined light intensity distribution in such a manner that intensity of the light in the periphery of the edge of the object to be irradiated becomes lower from the inside to the outside of the object to be irradiated.SELECTED DRAWING: Figure 1
Inventors:
ASHIDA KATSUMI
Application Number:
JP2014202704A
Publication Date:
May 09, 2016
Filing Date:
October 01, 2014
Export Citation:
Assignee:
HOYA CANDEO OPTRONICS CORP
International Classes:
H01L21/027; G02B19/00; G03F7/20
Domestic Patent References:
| JPH04258113A | 1992-09-14 | |||
| JPH05217885A | 1993-08-27 | |||
| JPH04258113A | 1992-09-14 |
Foreign References:
| WO2011125420A1 | 2011-10-13 |
Attorney, Agent or Firm:
Yoshiyuki Araki
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