Title:
IMAGING PATTERN SIMULATION SYSTEM, IMAGING PATTERN SIMULATION METHOD, IMAGING PATTERN SIMULATION PROGRAM AND RECORDING MEDIUM RECORDING THIS PROGRAM
Document Type and Number:
Japanese Patent JP2016086060
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an imaging pattern simulation system and an imaging pattern simulation method which allow for simulation in an extremely short time, even when the shape of a part of a mask pattern is changed, without consuming a large amount of memory.SOLUTION: An imaging pattern simulation system includes division means for dividing a mask pattern into a plurality of small patterns, library creation storage means for calculating and storing an imaging pattern formed by a transmitted beam of each small pattern, first imaging pattern creation means for creating a first imaging pattern, by bonding the imaging patterns corresponding to the small pattern based on the library, binding wave calculation means for obtaining a binding wave by dividing the vicinity of bonding surface in the first imaging pattern into boundary elements, and obtaining a binding wave by solving an integral equation, and second imaging pattern creation means for creating a second imaging pattern by a mask, from the binding wave thus obtained and the first imaging pattern.SELECTED DRAWING: Figure 1
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Inventors:
SUGISAKA JUNICHIRO
YASUI TAKASHI
HIRAYAMA KOICHI
YASUI TAKASHI
HIRAYAMA KOICHI
Application Number:
JP2014217379A
Publication Date:
May 19, 2016
Filing Date:
October 24, 2014
Export Citation:
Assignee:
KITAMI INST OF TECH
International Classes:
H01L21/027; G02B19/00; G03F1/36
Domestic Patent References:
| JP2002196230A | 2002-07-12 | |||
| JP2003520999A | 2003-07-08 |
Attorney, Agent or Firm:
Yoshiharu Yoshida
Mayuko Horikoshi
Mayuko Horikoshi