Title:
SUBSTRATE AGENT AND MANUFACTURING METHOD OF STRUCTURE CONTAINING PHASE SEPARATION STRUCTURE
Document Type and Number:
Japanese Patent JP2016108436
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a substrate agent enhancing phase separation performance of a block copolymer and capable of simply being used and a manufacturing method of a structure containing a phase separation structure using the same.SOLUTION: There is provided a substrate agent used for phase separation of a layer containing a block copolymer to which several kinds of block formed on a base material bind, containing a resin component which is a polystyrene derivative having a substituent group represented by the formula (u1-1). (u1-1), where R is H, a C1 to 5 alkyl group or a C1 to 5 alkyl halide group, Ris a halogen atom or O, a C1 to 20 linear, branched, cyclic or combination thereof hydrocarbon group which may contain a halogen atom or a silicon atom and p is an integer of 1 to 5.SELECTED DRAWING: None
Inventors:
YAHAGI MASATO
MAEBASHI TAKAYA
KAWAKAMI AKINARI
SUZUKI KAZUO
MATSUMIYA YU
KUROSAWA TSUYOSHI
YAMANO HITOSHI
MAEBASHI TAKAYA
KAWAKAMI AKINARI
SUZUKI KAZUO
MATSUMIYA YU
KUROSAWA TSUYOSHI
YAMANO HITOSHI
Application Number:
JP2014246812A
Publication Date:
June 20, 2016
Filing Date:
December 05, 2014
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
C09D125/04; C08F8/00; C08F12/04; C09D5/00; H01L21/027
Domestic Patent References:
| JP2008036491A | 2008-02-21 | |||
| JP2014070154A | 2014-04-21 | |||
| JP2014185318A | 2014-10-02 | |||
| JP2016528713A | 2016-09-15 | |||
| JP2014157929A | 2014-08-28 | |||
| JP2013524546A | 2013-06-17 | |||
| JP2015528026A | 2015-09-24 | |||
| JP2013073974A | 2013-04-22 |
Foreign References:
| WO2014184114A1 | 2014-11-20 | |||
| WO2013073505A1 | 2013-05-23 |
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Matsumoto
Ryu Miyamoto
Masato Iida
Masatake Shiga
Matsumoto
Ryu Miyamoto
Masato Iida