DESIGN METHOD OF EXPOSURE DEVICE

Japanese Patent JP2016152270

A

PROBLEM TO BE SOLVED: To provide an exposure device including a plurality of lamps optimally arranged therein.SOLUTION: An exposure device 10 includes: a lamp group 11 comprising a plurality of lamps 12; and an integrator 14 configured to receive light from the plurality of lamps 12 to enhance the uniformity of the light. In the exposure device, the following conditional expressions 1, 2 are satisfied. Conditional expression 1: a≤tanθ×L×2 Conditional expression 2: θ-θ=θIn the expressions, a: a longitudinal dimension and a lateral dimension of the lamp group; L: a distance from a light emitting position of the lamp group to an incident position of the integrator; θ: a maximum value of angles between an optical axis of each lamp and a central axis of the integrator; θ: an opening angle of light from each lamp; and θ: an integrator incident angle.SELECTED DRAWING: Figure 6

JP2008156654	MICROELECTRONICS CLEANING COMPOSITION CONTAINING HALOGEN OXYACID, ITS SALT, AND DERIVATIVE
JP6380445	Nanoimprint method
JP2009295779	CALCULATION METHOD OF OPTICAL CHARACTERISTICS, CALCULATION APPARATUS OF OPTICAL CHARACTERISTICS, CONTROL METHOD OF OPTICAL CHARACTERISTICS, CONTROL APPARATUS OF OPTICAL CHARACTERISTICS, OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING OF ELECTRONIC DEVICE

WATANABE KANA
YAMADA YOSHIHIKO

JP2015027872A

August 22, 2016

February 16, 2015

Click for automatic bibliography generation  

PHOENIX ELECTRIC CO LTD

H01L21/027; F21S2/00; F21V5/04; G02B3/00; G02B19/00; G03F7/20

Yuji Tada
Hiroharu Kitahara
Satoshi Yamauchi
Seiko Ito

Previous Patent: Ｆｅ基合金組成物、軟磁性体粉末、成形部材、圧粉コア、電気・電子部品�...

Next Patent: METHOD FOR MANUFACTURING VERTICAL HALL ELEMENT