Title:
METHOD FOR PRODUCING POLISHING PAD
Document Type and Number:
Japanese Patent JP2018122427
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a method for producing a polishing pad which has a base material formed by impregnating and curing a liquid resin containing an epoxy resin in a non-woven fabric excellent in polishing efficiency.SOLUTION: There is provided a method for producing a polishing pad 1 which has a base material 2 obtained by impregnating and curing a liquid resin containing an epoxy resin as a main component in a non-woven fabric 3 formed of a polyester fiber, a polypropylene fiber, a cellulose fiber or a nylon fiber, relatively moves the workpiece along a tool reference surface while supplying a slurry containing a polishing material between the tool reference surface and the workpiece, and polishes the workpiece, where the epoxy resin used for the liquid resin forming the base material 2 has an epoxy equivalent of 150 to 300, and is formed of a bisphenol A type or a bisphenol F type main agent diluted with 10 to 20% of aromatic hydrocarbon and a curing agent having an active hydrogen equivalent (amine equivalent) of 200 to 500.SELECTED DRAWING: Figure 1
Inventors:
TANI YASUHIRO
KIRINO CHUJI
KIRINO CHUJI
Application Number:
JP2017019062A
Publication Date:
August 09, 2018
Filing Date:
February 03, 2017
Export Citation:
Assignee:
RITSUMEIKAN
CRYSTAL KOGAKU KK
CRYSTAL KOGAKU KK
International Classes:
B24B37/24
Domestic Patent References:
| JP2012101298A | 2012-05-31 | |||
| JPH08245858A | 1996-09-24 | |||
| JPH11138420A | 1999-05-25 | |||
| JP2015045117A | 2015-03-12 | |||
| JP2012081565A | 2012-04-26 | |||
| JP2016043451A | 2016-04-04 |
Attorney, Agent or Firm:
Katsuhiko Hashimoto
Kyoko Hashimoto
Kyoko Hashimoto