Title:
PHOTORESISTS COMPRISING IONIC COMPOUND
Document Type and Number:
Japanese Patent JP2018185531
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide new photoresist compositions that comprise a component that comprises a radiation-insensitive ionic compound.SOLUTION: Preferred photoresists may comprise a resin with photoacid-labile groups; a photoacid generator compound; and a radiation-insensitive ionic compound that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer.SELECTED DRAWING: None
Inventors:
GERHARD POHLERS
LIU KONG
CHENG BAI SU
WOO CHU NI
LIU KONG
CHENG BAI SU
WOO CHU NI
Application Number:
JP2018130126A
Publication Date:
November 22, 2018
Filing Date:
July 09, 2018
Export Citation:
Assignee:
ROHM & HAAS ELECT MAT
International Classes:
G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office