Title:
COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2018203715
Kind Code:
A
Abstract:
To provide a compound, a resin and a resist composition that make it possible to produce a resist pattern with excellent line edge roughness (LER).SOLUTION: The present invention provides, for example, compounds represented by formula (I-1), formula (I-13), a resin containing a structural unit derived from the compound, and a resist composition containing the resin.SELECTED DRAWING: None
Inventors:
MASUYAMA TATSURO
SHIMADA MASAHIKO
ICHIKAWA KOJI
SHIMADA MASAHIKO
ICHIKAWA KOJI
Application Number:
JP2018091671A
Publication Date:
December 27, 2018
Filing Date:
May 10, 2018
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C69/54; C07C69/96; C08F20/30; G03F7/004; G03F7/038; G03F7/039
Domestic Patent References:
| JP2017057193A | 2017-03-23 |
Foreign References:
| WO2007049593A1 | 2007-05-03 | |||
| WO2010104074A1 | 2010-09-16 |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation