Title:
EXPOSURE APPARATUS AND METHOD OF MANUFACTURING ARTICLE
Document Type and Number:
Japanese Patent JP2019028223
Kind Code:
A
Abstract:
To correct a distortion of rotation asymmetricity which generates at a position defocused.SOLUTION: An exposure apparatus for exposing a substrate includes: an illumination optical system for illuminating a mask; a projection optical system for projecting a pattern of the mask on the substrate; and an eccentricity mechanism for decentering at least one optical element of the illumination optical system to an optical axis of the projection optical system, or decentering at least one optical element of the projection optical system to an optical axis of the illumination optical system, where a distortion of rotation asymmetricity generated at a position defocused from a focal position of the projection optical system is changed by decentering the optical element by the eccentricity mechanism.SELECTED DRAWING: Figure 1
Inventors:
MIZUTANI MASAKI
Application Number:
JP2017146780A
Publication Date:
February 21, 2019
Filing Date:
July 28, 2017
Export Citation:
Assignee:
CANON KK
International Classes:
G03F7/20; G02B13/22; G02B13/24
Domestic Patent References:
| JP2002015987A | 2002-01-18 | |||
| JPH08316123A | 1996-11-29 | |||
| JP2003059817A | 2003-02-28 | |||
| JP2005101314A | 2005-04-14 | |||
| JP2006019702A | 2006-01-19 | |||
| JP2000114163A | 2000-04-21 | |||
| JP2001237183A | 2001-08-31 |
Attorney, Agent or Firm:
Takuma Abe
Sogo Kuroiwa
Sogo Kuroiwa