Title:
DIFFRACTION OPTICAL ELEMENT, LIGHT IRRADIATION DEVICE, LIGHT IRRADIATION SYSTEM AND CORRECTION METHOD OF PROJECTION PATTERN
Document Type and Number:
Japanese Patent JP2019028456
Kind Code:
A
Abstract:
To provide a diffraction optical element capable of easily correcting distortion caused by an imaging lens, a light irradiation device, a light irradiation system and a correction method of a projection pattern.SOLUTION: A diffraction optical element 10 is a diffraction optical element for shaping light and includes a diffraction grating that projects a first projection pattern 23 as a projection pattern projected by diffracting incident light to exit, and a position reference pattern 24 that is a projection pattern different from the first projection pattern 23, for specifying a position in the projection pattern.SELECTED DRAWING: Figure 5
Inventors:
OKAWA KOJIRO
INAZUKI YUICHI
INAZUKI YUICHI
Application Number:
JP2018131403A
Publication Date:
February 21, 2019
Filing Date:
July 11, 2018
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD
International Classes:
G02B5/18; G06T5/00
Domestic Patent References:
| JP2016166815A | 2016-09-15 | |||
| JP2002056348A | 2002-02-20 | |||
| JP2008131250A | 2008-06-05 | |||
| JP2009109322A | 2009-05-21 | |||
| JP2011048773A | 2011-03-10 | |||
| JP2008225553A | 2008-09-25 | |||
| JP2008191999A | 2008-08-21 | |||
| JP2007122229A | 2007-05-17 | |||
| JP2014167550A | 2014-09-11 |
Foreign References:
| US20090084852A1 | 2009-04-02 | |||
| CN101135776A | 2008-03-05 |
Attorney, Agent or Firm:
Masayuki Masabayashi
Tetsuo Shiba
Hayashi Ichiyoshi
Tetsuo Shiba
Hayashi Ichiyoshi