Title:
EXPOSURE METHOD AND EXPOSURE DEVICE
Document Type and Number:
Japanese Patent JP2019056875
Kind Code:
A
Abstract:
To provide an exposure method capable of achieving exposure position accuracy higher than positioning accuracy of an exposure position of an exposure device.SOLUTION: An exposure method includes: (1) a step of calculating an exposure position on a workpiece from a relative positional relationship between an exposure mask and the workpiece; (2) a step of setting a range allowing projection of a pattern even when the exposure position is deviated from a target exposure position on the workpiece, as an exposure positional range; and (3) a step of irradiating the exposure mask with exposure light when the exposure position is in the exposure positional range, and executing exposure control of stopping the exposure light when the exposure position is deviated from the exposure positional range, and projects the pattern on the exposure mask onto the workpiece using the exposure control of the exposure light.SELECTED DRAWING: Figure 1
Inventors:
OGIWARA MOTONORI
Application Number:
JP2017182352A
Publication Date:
April 11, 2019
Filing Date:
September 22, 2017
Export Citation:
Assignee:
MITUTOYO CORP
International Classes:
G03F7/20
Domestic Patent References:
| JPH05335205A | 1993-12-17 | |||
| JPH0992611A | 1997-04-04 | |||
| JP2007052080A | 2007-03-01 | |||
| JPH0215614A | 1990-01-19 | |||
| JPH06204115A | 1994-07-22 | |||
| JP2000058412A | 2000-02-25 | |||
| JPH09115799A | 1997-05-02 | |||
| JP2010266760A | 2010-11-25 | |||
| JPH1064809A | 1998-03-06 | |||
| JPH10261561A | 1998-09-29 | |||
| JP2003255550A | 2003-09-10 |
Attorney, Agent or Firm:
Yuji Iwahashi
Shinji Kato
Shinji Kato