Title:
BUFFER MATERIAL
Document Type and Number:
Japanese Patent JP2019065915
Kind Code:
A
Abstract:
To provide a structure where even when a contact member contacts with a certain projection 14 in advance, failure such as settling, wearing or damage is hard to occur on the certain projection 14, in a buffer material 11 where a plurality of projections 14 are circumferentially provided on an annular end surface part 11a.SOLUTION: A buffer material 11 comprises a plurality of projections 14 circumferentially provided on an annular end surface part 11a. The projection 14 is formed so that a projection height thereof becomes gradually smaller from one end part 14a toward the other end part 14b in a circumferential direction. Also, the projection 14 is formed so as to have a pointed end part where a projection side surface and a projection tip surface intersect with each other at an acute angle at the one end part 14a in the circumferential direction.SELECTED DRAWING: Figure 1
Inventors:
HAYAKAWA KAZUKI
USAMI TAKASHI
USAMI TAKASHI
Application Number:
JP2017190180A
Publication Date:
April 25, 2019
Filing Date:
September 29, 2017
Export Citation:
Assignee:
NOK CORP
International Classes:
F16F9/58; B60G7/00; F16F7/00
Attorney, Agent or Firm:
Kiriyama Dai
Yoichi Nomoto
Yoichi Nomoto