Title:
PELLICLE FRAME AND PELLICLE
Document Type and Number:
Japanese Patent JP2019070745
Kind Code:
A
Abstract:
To provide a pellicle frame which can effectively prevent such problems that upon forming a fine pattern in a size of 10 nm or less in a photoresist film by use of an EUV exposure technology, a pellicle film has wrinkles or a pellicle film is peeled from a pellicle frame, broken or cracked, and which is lightweight and has a low risk of breakage, and a pellicle using the pellicle frame.SOLUTION: A pellicle frame is made of metal or alloy having a coefficient of linear expansion of 10×10(1/K) or less and a density of 4.6 g/cmor less. A pellicle including the above pellicle frame as a constituent is also provided.SELECTED DRAWING: Figure 1
Inventors:
YANASE YU
Application Number:
JP2017197004A
Publication Date:
May 09, 2019
Filing Date:
October 10, 2017
Export Citation:
Assignee:
SHINETSU CHEMICAL CO
International Classes:
G03F1/64
Domestic Patent References:
| JP2009025559A | 2009-02-05 | |||
| JP2002040629A | 2002-02-06 | |||
| JP2016191902A | 2016-11-10 | |||
| JPH1070066A | 1998-03-10 | |||
| JP2016130789A | 2016-07-21 | |||
| JP2015018228A | 2015-01-29 | |||
| JP2009243417A | 2009-10-22 | |||
| JP2016200616A | 2016-12-01 |
Foreign References:
| US20060246234A1 | 2006-11-02 | |||
| KR20170067662A | 2017-06-16 |
Attorney, Agent or Firm:
Hideaki International Patent Office