Title:
SUBSTRATE PROCESSING METHOD
Document Type and Number:
Japanese Patent JP2019071450
Kind Code:
A
Abstract:
To provide a substrate processing apparatus and a substrate processing method that can perform processing on a substrate with high quality.SOLUTION: A substrate processing apparatus 1 includes: a substrate holding unit 5; a rotation drive unit 7, a treatment liquid supply unit 11; an outer cup 31, and an inner cup 21. The inner cup 21 is movable across a range between a recovery position at which the inner cup 21 recovers a processing liquid and a retracted position at which the outer cup 31 recovers the treatment liquid. The inner cup 21 includes: an inner cup body exhibiting an annular outer shape; and a drainage port, formed in the inner cup body, for discharging the treatment liquid in the inner cup body; and an exhaust port formed in the inner cup body, for exhausting a gas in the inner cup body. The outer cup 31 includes: an outer cup body having an annular outer shape; a drainage port formed in the outer cup body for discharging the treatment liquid in the outer cup body; and an exhaust port formed in the outer cup body and exhausting the gas in the outer cup body.SELECTED DRAWING: Figure 2
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Inventors:
KASHIWAYAMA MASATO
NISHIYAMA KOJI
KABUNE KOTA
NISHIYAMA KOJI
KABUNE KOTA
Application Number:
JP2018239816A
Publication Date:
May 09, 2019
Filing Date:
December 21, 2018
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD
International Classes:
H01L21/027; H01L21/304
Attorney, Agent or Firm:
Tsutomu Sugiya
Hiroyuki Todaka
Tomohiko Sugitani
Kurihara Kaname
Hiroyuki Todaka
Tomohiko Sugitani
Kurihara Kaname