Title:
COMPOUND, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2019112619
Kind Code:
A
Abstract:
To provide a compound and the like capable of producing a resist pattern having excellent CD uniformity (CDU).SOLUTION: The compound is represented by formula (I) [where Rrepresents H or a methyl group; Lrepresents a single bond or a C1-8 alkanediyl group; Rand Reach represents H, a C3-18 alicyclic hydrocarbon group, a C1-6 alkyl group, or a group composed of a combination thereof; Rand Reach represent H or an alkyl group or are bonded to each other to form a ring; and Rrepresents H or a cyano group].SELECTED DRAWING: None
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Inventors:
SAKAMOTO HIROSHI
OKADA NATSUKI
ICHIKAWA KOJI
OKADA NATSUKI
ICHIKAWA KOJI
Application Number:
JP2018231944A
Publication Date:
July 11, 2019
Filing Date:
December 11, 2018
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C08F20/10; C07C69/757; C07C255/46; C07C255/47; C08F220/10; G03F7/004; G03F7/039
Domestic Patent References:
| JP2003043690A | 2003-02-13 | |||
| JP2017008181A | 2017-01-12 |
Foreign References:
| CN102443349A | 2012-05-09 | |||
| CN102358717A | 2012-02-22 |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation