Title:
PHOTOMASK, BLANK FOR IMPRINT MOLD, AND METHOD OF PRODUCING THE SAME
Document Type and Number:
Japanese Patent JP2019113714
Kind Code:
A
Abstract:
To provide a photomask capable of producing a blank for imprint mold having a convex structure part excellent in position accuracy and angle accuracy, a blank for imprint mold having a convex structure part excellent in position accuracy and angle accuracy, and a method of producing the same.SOLUTION: A photomask for producing a blank for imprint mold having a convex structure part protruding from one side of a base part includes: a mask substrate; a mask pattern provided on a first face of the mask substrate, and corresponding to the convex structure part; and an alignment mark group including a plurality of alignment marks provided outside of the mask pattern, where the alignment mark group includes first-fourth alignment mark groups corresponding to first-fourth sides defining an outer edge of a plane view rectangular substrate for a blank for producing a blank for imprint mold, and each alignment mark group includes at least one alignment mark.SELECTED DRAWING: Figure 1
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Inventors:
YAMADA JUNICHI
IIMURA KEITA
AMAMI SHINYA
YAMAMOTO YUICHI
IIMURA KEITA
AMAMI SHINYA
YAMAMOTO YUICHI
Application Number:
JP2017247252A
Publication Date:
July 11, 2019
Filing Date:
December 25, 2017
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD
International Classes:
G03F1/70; B29C33/38; B29C59/02; G03F1/42; H01L21/027
Domestic Patent References:
| JP2017175056A | 2017-09-28 | |||
| JP2015225996A | 2015-12-14 | |||
| JPH08181060A | 1996-07-12 | |||
| JPH0360008A | 1991-03-15 | |||
| JP2011075727A | 2011-04-14 |
Foreign References:
| US20120021140A1 | 2012-01-26 |
Attorney, Agent or Firm:
Masataka Ota
Yasuhiro Kanamori
Yasuhiro Kanamori