Title:
POLISHING PAD
Document Type and Number:
Japanese Patent JP2019118981
Kind Code:
A
Abstract:
To provide a polishing pad that in performing polishing by attaching the pad to a convexly-bent surface of a polishing base material having the surface, can prevent the pad from being detached from the surface and suppress edge-sagging that can be caused in an edge part of an object to be polished after the polishing.SOLUTION: The polishing pad comprises a resin layer 1 including non-woven fabric and resin, and is attached to a surface of a rotary polishing member having a convexly-bent surface therein to perform polishing. Shore A hardness of the resin later 1 is 60° or more, and the resin layer 1 satisfies a condition represented by the following formula (1): 200(mm)≤h-h(1), where the h-his determined by subjecting the resin layer 1 to flexural rigidity test by which a belt-like sample having one end and the other end in a longitudinal direction thereof and having a length of 1000 mm and a width of 100 mm is used and a part corresponding to an area with a length of 500 mm and a width of 100 mm from one end of the sample is fixed to a horizontal table 2 at a height hfrom the ground so that a height hof the other end is measured.SELECTED DRAWING: Figure 1
Inventors:
KASHIWADA FUTOSHI
TOKUSHIGE SHIN
TOKUSHIGE SHIN
Application Number:
JP2017254116A
Publication Date:
July 22, 2019
Filing Date:
December 28, 2017
Export Citation:
Assignee:
FUJIBO HOLDINGS INC
International Classes:
B24B9/00; B24B29/00; B24B45/00; H01L21/304
Domestic Patent References:
| JP2001244221A | 2001-09-07 | |||
| JPH0885051A | 1996-04-02 | |||
| JP2006156688A | 2006-06-15 | |||
| JP2004063900A | 2004-02-26 |
Foreign References:
| US20010014570A1 | 2001-08-16 | |||
| WO2002005337A1 | 2002-01-17 | |||
| US20030153251A1 | 2003-08-14 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito