Title:
ANALYSIS SUBSTRATE
Document Type and Number:
Japanese Patent JP2019128282
Kind Code:
A
Abstract:
To provide an analysis substrate which enables high-sensitivity optical analysis that utilizes electric field enhancement induced by surface plasmon resonance.SOLUTION: An analysis substrate 10 comprises: a substrate 1 having at least a first surface 1a made of a dielectric or semiconductor material, and a two-dimensional lattice structure provided on the first surface 1a and comprised of a plurality of periodically arrayed recesses or protrusions; a metal film 3 provided on the first surface 1a of the substrate 1, the metal film having a surface sheet resistivity of 5000 Ω/sq. or less at 25°C; and a plurality of metallic nanoparticles 5 dispersively disposed on the metal film 3, the metallic nanoparticles having an average primary particle diameter of 5-100 nm.SELECTED DRAWING: Figure 1
Inventors:
SHINOZUKA HIROSHI
DAI KOTARO
MIURA SHOGO
DAI KOTARO
MIURA SHOGO
Application Number:
JP2018010683A
Publication Date:
August 01, 2019
Filing Date:
January 25, 2018
Export Citation:
Assignee:
OJI HOLDINGS CORP
International Classes:
G01N21/41; B82Y30/00
Domestic Patent References:
| JP2012132875A | 2012-07-12 | |||
| JP2015163845A | 2015-09-10 | |||
| JP2015055482A | 2015-03-23 | |||
| JP2014163868A | 2014-09-08 |
Foreign References:
| WO2014025035A1 | 2014-02-13 | |||
| US20110267610A1 | 2011-11-03 | |||
| US20120170033A1 | 2012-07-05 | |||
| WO2010088276A2 | 2010-08-05 |
Attorney, Agent or Firm:
Yasushi Matsunuma
Yuichiro Kawagoe
Noriko Yanai
Shunsuke Fushimi
Tetsuya Kimitsuka
Yuichiro Kawagoe
Noriko Yanai
Shunsuke Fushimi
Tetsuya Kimitsuka