Title:
CONTAINER FOR CHEMICAL PRECURSOR IN DEPOSITION PROCESSING
Document Type and Number:
Japanese Patent JP2019143248
Kind Code:
A
Abstract:
To provide a system for storing or feeding a chemical precursor to be used in the manufacture of a semiconductor device, and method using the system.SOLUTION: In one mode, a storage system comprises a chemical precursor and a container, and has an entrance jet-flow engineering. The chemical precursor has a low vapor pressure lower than about 50 Torrs at an absolute pressure at a vessel temperature set for the feed. A feed system further contains a carrier gas. An entrance jet design feeds a carrier gas under a pressure and at a low rate. The carrier gas collides on the surface of the chemical precursor and can produce the vapor or liquid droplet of the chemical precursor. Next, the vapor or liquid droplet of the chemical precursor gathers together with the carrier gas, and provides a precursor containing fluid flow to pass a processing tool and used by a treatment tool.SELECTED DRAWING: Figure 1
Inventors:
JAMES PATRICK NEHLSEN
BIRTCHER CHARLES MICHAEL
BIRTCHER CHARLES MICHAEL
Application Number:
JP2019072118A
Publication Date:
August 29, 2019
Filing Date:
April 04, 2019
Export Citation:
Assignee:
VERSUM MAT US LLC
International Classes:
C23C16/448; H01L21/31
Attorney, Agent or Firm:
Atsushi Aoki
Shinji Mitsuhashi
Kenji Kimura
Naori Kota
Shinji Mitsuhashi
Kenji Kimura
Naori Kota