Title:
MANUFACTURING METHOD OF REPLICA TEMPLATE, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND MASTER TEMPLATE
Document Type and Number:
Japanese Patent JP2019160926
Kind Code:
A
Abstract:
To form a fine pattern and a mesa part collectively.SOLUTION: A manufacturing method of a replica template includes a substrate preparation step of preparing a substrate having a first mesa part projecting from a first face on the first face, a mask pattern formation step of forming a first mask pattern, having a protrusion of smaller region than the first mesa part in the top view, and a fine pattern placed on the protrusion, on the first mesa part of the substrate, a mesa part formation step of forming a second mesa part having a region smaller than the first mesa part, in the top view, on the first mesa part, by transferring the shape of the protrusion of the first mask pattern to the substrate, and a fine pattern formation step of forming a fine pattern on the second mesa part by transferring the fine pattern of the first mask pattern to the substrate.SELECTED DRAWING: Figure 1
Inventors:
TANABE MANA
KANEMITSU SHINGO
KANEMITSU SHINGO
Application Number:
JP2018043209A
Publication Date:
September 19, 2019
Filing Date:
March 09, 2018
Export Citation:
Assignee:
TOSHIBA MEMORY CORP
International Classes:
H01L21/027; B29C33/38; B29C59/02
Domestic Patent References:
| JP2010137538A | 2010-06-24 | |||
| JP2014007361A | 2014-01-16 |
Foreign References:
| WO2017204260A1 | 2017-11-30 |
Attorney, Agent or Firm:
Sakai International Patent Office