Title:
REMOVAL SYSTEM AND REMOVAL METHOD FOR REMOVING MOISTURE FROM MOISTURE-CONTAINING ORGANIC SOLVENT
Document Type and Number:
Japanese Patent JP2019166477
Kind Code:
A
Abstract:
To provide a removal system for removing moisture from a moisture-containing organic solvent capable of reducing a moisture content in the organic solvent to less than 10 ppm, and improving a recovery rate remarkably compared with hitherto.SOLUTION: A removal system 1 for removing moisture from a moisture-containing organic solvent has a solvent container 12 for storing an organic solvent, an introduction part 123 for introducing carrer gas into the solvent container, and a lead-out part 124 for leading out mixed gas containing vaporized gas vaporized from the organic solvent and carrier gas, from the solvent container 12.SELECTED DRAWING: Figure 1
Inventors:
SUZUKI SAYAKA
KOURA TERUMASA
NOZAWA FUMIKAZU
KOURA TERUMASA
NOZAWA FUMIKAZU
Application Number:
JP2018056490A
Publication Date:
October 03, 2019
Filing Date:
March 23, 2018
Export Citation:
Assignee:
AIR LIQUIDE JAPAN LTD
International Classes:
B01D3/00; B01D53/26
Domestic Patent References:
| JP2011078880A | 2011-04-21 | |||
| JP2008161743A | 2008-07-17 | |||
| JP2001129302A | 2001-05-15 | |||
| JPS5029472A | 1975-03-25 | |||
| JPS52139671A | 1977-11-21 |
Attorney, Agent or Firm:
Patent Business Corporation Unias International Patent Office