Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
MULTI CHARGED PARTICLE BEAM DRAWING APPARATUS AND MULTI CHARGED PARTICLE BEAM DRAWING METHOD
Document Type and Number:
Japanese Patent JP2019176047
Kind Code:
A
Abstract:
To provide a drawing apparatus capable of realizing a high precise drawing in the case where a failure beam radiating an unnecessary dose amount occurs in a multi beam.SOLUTION: A drawing apparatus comprises: a failure pattern data generation part 52 generating failure pattern data using a failure region formation radiated by a failure beam that radiates a dose amount larger than a control dose amount from a drawing region of a sample as a pattern; a reversal processing part 53 generating reversal pattern data obtained by reversing the failure pattern data; a rasterization part 54 converting the reversal pattern data into reversal pattern pixel data in which a value corresponding to the dose amount in each pixel is defined; a synthesizing part 60 generating synthesized pixel data obtained by adding the value defined to the reversal pattern pixel data and the drawing pattern pixel data in each pixel; and a drawing mechanism 150 performing a multiple drawing using a multi beam, and in which the beam of the dose amount corresponding to the value defined to the synthesized pixel data is radiated to each pixel.SELECTED DRAWING: Figure 1

Inventors:
YOSHIKAWA RYOICHI
INOUE HIDEO
Application Number:
JP2018063810A
Publication Date:
October 10, 2019
Filing Date:
March 29, 2018
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
NUFLARE TECHNOLOGY INC
International Classes:
H01L21/027; G03F7/20; H01J37/305
Domestic Patent References:
JP2017073461A2017-04-13
JP2015106605A2015-06-08
JP2018010895A2018-01-18
JPH0629199A1994-02-04
JPH0473929A1992-03-09
JP2007110087A2007-04-26
Attorney, Agent or Firm:
Tetsuma Ikegami
Akira Sudo
Mitsuyuki Matsuyama