CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM DRAWING METHOD

Japanese Patent JP2019176049

A

To provide a drawing apparatus capable of correcting deviations of a local formation of a drawing pattern when drawing a charged particle beam by using pixel data.SOLUTION: A drawing apparatus comprises: a detection part 50 detecting a diagram part requiring a formation correction by interpreting the formation of a plurality of diagram patterns; a correction drawing data generation part 51 that corrects the diagram part detected, and generates correction diagram pattern data having dose information; a rasterization part 64 converting the pattern data of the plurality of diagram patterns to drawing pattern pixel data in which a dose amount in each pixel is defined; a rasterization part 52 converting the pattern data of the correction diagram pattern to the correction diagram pattern pixel data in which a value corresponding to the dose amount in each pixel is defied in a pixel setting in common with the drawing pattern pixel data; and an adding part 65 generating synthesized pixel data obtained by adding the value defined to the drawing pattern pixel data and the correction drawing pattern pixel data to each pixel.SELECTED DRAWING: Figure 1

JP2001350251	PELLICLE
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JP3535390	INSPECTION METHOD OF EXPOSURE MASK AND RECORD MEDIUM RECORDING PROGRAM FOR SEARCHING PLACE TO MEASURE ITS LENGTH

YOSHIKAWA RYOICHI
INOUE HIDEO

JP2018063857A

October 10, 2019

March 29, 2018

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NUFLARE TECHNOLOGY INC

H01L21/027; H01J37/305

JPH0963926A	1997-03-07
JP2013527981A	2013-07-04
JP2009004699A	2009-01-08
JP2015045720A	2015-03-12
JP2014049467A	2014-03-17
JP2017139458A	2017-08-10
JP2018006748A	2018-01-11
JP2008505363A	2008-02-21
JP2013125800A	2013-06-24
JP2008256932A	2008-10-23

Tetsuma Ikegami
Akira Sudo
Mitsuyuki Matsuyama

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