Title:
METHOD FOR MANUFACTURING RESIST FILM-FORMED SUBSTRATE AND PROCESS MANAGEMENT SYSTEM FOR MANUFACTURING RESIST FILM-FORMED SUBSTRATE
Document Type and Number:
Japanese Patent JP2020021940
Kind Code:
A
Abstract:
To pattern a resist film appropriately.SOLUTION: The method includes: an application step of applying resist films 18, 19 on a substrate 10MG; an exposure step of selectively exposing the resist films 18, 19 applied in the application step; and a developing step of developing the resist films 18, 19 selectively exposed in the exposure step with a developing time adjusted on the basis of the transition time from the application step to the developing step.SELECTED DRAWING: Figure 10
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Inventors:
YAMADA MASAHIRO
KIDA TETSUYA
OKAJIMA HIROAKI
KIDA TETSUYA
OKAJIMA HIROAKI
Application Number:
JP2019142026A
Publication Date:
February 06, 2020
Filing Date:
August 01, 2019
Export Citation:
Assignee:
SHARP KK
International Classes:
H01L21/027; B05C9/12; B05C13/02; B05D3/06; B05D3/10; B05D7/24
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Foreign References:
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Attorney, Agent or Firm:
Akatsuki Joint Patent Office