Title:
THIN FILM FORMING MATERIAL, OPTICAL THIN FILM, AND OPTICAL MEMBER
Document Type and Number:
Japanese Patent JP2020030435
Kind Code:
A
Abstract:
To provide a method for producing an optical thin film having a low index of refraction, a thin film forming material, an optical thin film and an optical member.SOLUTION: The method for producing an optical thin film is provided that includes the steps of: depositing a thin film forming material on a substrate in a non-oxidizing atmosphere by a physical vapor deposition method to form a vapor deposition film; and obtaining a first thin film having voids by bringing the vapor deposition film into contact with a first acidic solution containing the acidic substance in a range of pH 2.5 or more and pH 3.5 or less. The thin film forming material is a mixture including an indium oxide and a silicon oxide, wherein the indium oxide is 0.23 mol or more and 0.27 mol or less per 1 mol of the silicon oxide.SELECTED DRAWING: Figure 2
Inventors:
TANAKA GENTARO
TANAKA SUKEFUMI
TANAKA SUKEFUMI
Application Number:
JP2019206526A
Publication Date:
February 27, 2020
Filing Date:
November 14, 2019
Export Citation:
Assignee:
NICHIA KAGAKU KOGYO KK
International Classes:
G02B1/113; C23C14/10
Domestic Patent References:
| JP2013144634A | 2013-07-25 | |||
| JP2017504938A | 2017-02-09 | |||
| JP2006215542A | 2006-08-17 | |||
| JP2009544491A | 2009-12-17 | |||
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Foreign References:
| WO2001071394A1 | 2001-09-27 | |||
| WO2012086806A1 | 2012-06-28 | |||
| US20130194668A1 | 2013-08-01 |
Attorney, Agent or Firm:
Takeuchi/Ichizawa International Patent Office