Title:
PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING FINE PATTERN
Document Type and Number:
Japanese Patent JP2020034888
Kind Code:
A
Abstract:
To provide a novel photosensitive resin composition that can achieve excellent sensitivity and resolution, and a method for producing a fine pattern using the same.SOLUTION: A photosensitive resin composition contains a polymer of acid dianhydride and diamine, and a photoacid generator. The acid dianhydride has a norbornane compound having an atomic group obtained by removing one or more hydrogen atoms from a norbornane-2,3-dicarboxylic anhydride.SELECTED DRAWING: None
Inventors:
OYAMA TOSHIYUKI
MOTOMURA MOMOE
WATABE DAISUKE
MOTOMURA MOMOE
WATABE DAISUKE
Application Number:
JP2019036796A
Publication Date:
March 05, 2020
Filing Date:
February 28, 2019
Export Citation:
Assignee:
NAT UNIV YOKOHAMA
JX NIPPON OIL & ENERGY CORP
JX NIPPON OIL & ENERGY CORP
International Classes:
G03F7/023; C08G73/10; G03F7/027; G03F7/20
Domestic Patent References:
| JP2006267800A | 2006-10-05 | |||
| JP2011123277A | 2011-06-23 | |||
| JP2004279654A | 2004-10-07 | |||
| JP2019099516A | 2019-06-24 | |||
| JP2017115163A | 2017-06-29 | |||
| JP2011053366A | 2011-03-17 | |||
| JP2015087715A | 2015-05-07 |
Foreign References:
| WO2017126409A1 | 2017-07-27 |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshiki Kuroki
Yoshinori Shimizu
Hiroyuki Hirano
Yoshiki Kuroki
Yoshinori Shimizu
Hiroyuki Hirano