Title:
COMPOSITION FOR FILM FORMATION, GLASS SUBSTRATE COATED WITH THE COMPOSITION FOR FILM FORMATION, AND TOUCH PANEL USING THE GLASS SUBSTRATE
Document Type and Number:
Japanese Patent JP2020075992
Kind Code:
A
Abstract:
To provide a composition for film formation, which has excellent stability during storage and developability and, by coating and forming a cured film, forms a film having excellent adhesivity to a light transmissive substrate and electrodes as well as transparency, and a high insulation property even when being a thin film.SOLUTION: Provided is a composition for film formation, comprising a polysiloxane compound which satisfies the following condition 1, a polythiol compound which does not contain silicon in the molecule, a polymerization initiator, and an organic solvent. Materials which constitute the polysiloxane compound include a silane compound (A) which is at least one selected from a group of tetraalkoxysilanes and bis(trialkoxysilyl)alkanes, a silane compound (B) which is at least one selected from the group of alkyltrialkoxysilanes, dialkyldialkoxysilanes, cycloalkyltrialkoxysilanes, trialkoxysilanes, and phenyltrialkoxy silanes, and silane compounds (C) having a radically polymerizable unsaturated double bond.SELECTED DRAWING: None
Inventors:
IKEDO KEISUKE
MATSUOKA YUTAKA
OKAMOTO KATSUTOSHI
NAKANO TADASHI
MATSUOKA YUTAKA
OKAMOTO KATSUTOSHI
NAKANO TADASHI
Application Number:
JP2018209668A
Publication Date:
May 21, 2020
Filing Date:
November 07, 2018
Export Citation:
Assignee:
SAKATA INKS
International Classes:
C09D183/07; C09D7/63; G03F7/004; G03F7/027; G03F7/075; G03F7/20; G06F3/041
Domestic Patent References:
| JP2012212114A | 2012-11-01 | |||
| JP2015193820A | 2015-11-05 | |||
| JP2018076443A | 2018-05-17 |
Foreign References:
| WO2017150421A1 | 2017-09-08 | |||
| WO2017150420A1 | 2017-09-08 | |||
| WO2014185435A1 | 2014-11-20 |
Attorney, Agent or Firm:
Atomi International Patent Office