Title:
MULTI-ELECTRON BEAM INSPECTION DEVICE AND MULTI-ELECTRON BEAM INSPECTION METHOD
Document Type and Number:
Japanese Patent JP2020087507
Kind Code:
A
Abstract:
PURPOSE: To provide a device capable of creating a reference image adapted to a characteristic difference between beams more easily than the prior arts in multi-beam inspection.CONSTITUTION: A multi-electron beam inspection device is characterized in comprising: an image acquisition mechanism 150 which acquires a secondary electron image of multiple graphic patterns by radiating multi-primary electron beams; a reference image creation circuit 112 which creates a reference image corresponding to the secondary electron image in accordance with image generating characteristics obtained by radiating a representative beam of the multi-primary electron beams on the basis of design data to be a base of the multiple graphic patterns; and an image correction circuit 129 which creates a corrected reference image by correcting an edge shape of a graphic pattern of a secondary electron image obtained by radiating other beams within the reference image, on the basis of deviation information of inclination of an edge part between the graphic pattern of the secondary electron image obtained by radiating the representative beam of the multi-primary electron beams and the graphic pattern of the secondary electron image obtained by radiating other beams of the multi-primary electron beams.SELECTED DRAWING: Figure 1
Inventors:
INOUE HIROSHI
HIRANO RYOICHI
SHIRATO MASATAKA
OGAWA TSUTOMU
HIRANO RYOICHI
SHIRATO MASATAKA
OGAWA TSUTOMU
Application Number:
JP2018214428A
Publication Date:
June 04, 2020
Filing Date:
November 15, 2018
Export Citation:
Assignee:
NUFLARE TECHNOLOGY INC
International Classes:
H01J37/22; H01L21/66
Domestic Patent References:
| JP2013246062A | 2013-12-09 | |||
| JP2011008968A | 2011-01-13 |
Attorney, Agent or Firm:
Tetsuma Ikegami
Akira Sudo
Masahiro Takashita
Akira Sudo
Masahiro Takashita